ChemicalBook--->CAS DataBase List--->1115-99-7

1115-99-7

1115-99-7 Structure

1115-99-7 Structure
IdentificationBack Directory
[Name]

TRIETHYLGALLIUM
[CAS]

1115-99-7
[Synonyms]

Et3Ga
triethylgallane
TRIETHYLGALLIUM
triethyl-galliu
GALLIUM TRIETHYL
Triethylgallium,min.97%
Triethylgallium, min. 97%
Triethylgallium, Elec. Gr.
Triethylgalliumcolorlessliq
Triethylgalliumelecgrcolorlessliq
TRIETHYLGALLIUM ISO 9001:2015 REACH
Triethylgallium, elec. gr., 99.9998%
Triethylgallium,elec.gr.(99.9999%-Ga)PURATREM
Triethylgallium, elec. gr. (99.9999%-Ga) PURATREM **S.STEELCYL EXTRA**
[EINECS(EC#)]

214-232-7
[Molecular Formula]

C6H15Ga
[MDL Number]

MFCD00015094
[MOL File]

1115-99-7.mol
[Molecular Weight]

156.91
Chemical PropertiesBack Directory
[Melting point ]

-82,3°C
[Boiling point ]

143°C
[density ]

1,058 g/cm3
[Fp ]

-18°C
[form ]

liquid
[color ]

colorless
[Specific Gravity]

1.0586
[Hydrolytic Sensitivity]

10: reacts extremely rapidly with moisture and oxygen - may be pyrophoric - sealed system required
[Sensitive ]

moisture sensitive
[EPA Substance Registry System]

Gallium, triethyl- (1115-99-7)
Safety DataBack Directory
[Hazard Codes ]

F,C
[Risk Statements ]

14/15-17-34
[Safety Statements ]

16-36/37/39-43-45-36/37-26-8
[RIDADR ]

3203
[WGK Germany ]

3
[TSCA ]

TSCA listed
[REACH Registrations]

Inactive
[HazardClass ]

4.2
[PackingGroup ]

I
Hazard InformationBack Directory
[Chemical Properties]

Triethyl gallium is monomer in vapor and burns in air with a violent flame. Triethyl gallium is soluble in organic solvents such as ether and benzene, and decomposes rapidly in cold water to produce diethyl gallium hydroxide and ethane.
[Safety Profile]

Ignites spontaneously in air.Explodes in water or nitric acid.
[Synthesis]

Triethyl gallium can be obtained by co-heating gallium with diethylmercury at about 160°C.

Questions And AnswerBack Directory
[Application]

High-purity triethylgallium and other organometallic compounds are the most important and widely used raw materials for growing optoelectronic materials in metal-organic chemical vapor deposition (MOCVD) and chemical beam epitaxy (CBE), and are widely used in growing compound semiconductor thin film materials such as indium gallium arsenide nitride (InGaAsN), indium gallium arsenide (InGaAs), and indium gallium phosphide (InGaP).
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