| Identification | Back Directory | [Name]
Imidazo[4,5-d]imidazole-2,5(1H,3H)-dione,-tetrahydro-1,3,4,6-tetrakis(methoxymethyl)-3a-methyl-6a-propyl | [CAS]
220140-29-4 | [Synonyms]
Fandachem-cas_220140_29_4
cas-220140-29_4_fandachem
cas_220140-29_4-China-supplier-FandaChem
3a-methyl-6a-n-propyl-1,3,4,6-tetramethoxymethyl glycolurea
Tetrahydro-1,3,4,6-tetrakis(methoxymethyl)-3a-methyl-6a-propylimidazo[4,5-d]imidazole-2,5(1H,3H)-dione
Imidazo[4,5-d]imidazole-2,5(1H,3H)-dione,-tetrahydro-1,3,4,6-tetrakis(methoxymethyl)-3a-methyl-6a-propyl | [EINECS(EC#)]
682-847-1 | [Molecular Formula]
C16H30N4O6 | [MOL File]
220140-29-4.mol | [Molecular Weight]
374.43 |
| Chemical Properties | Back Directory | [Melting point ]
87-89 °C | [Boiling point ]
474.7±45.0 °C(Predicted) | [density ]
1.171±0.06 g/cm3(Predicted) | [form ]
powder | [pka]
-1.27±0.60(Predicted) | [color ]
White | [InChI]
InChI=1S/C16H30N4O6/c1-7-8-16-15(2,17(9-23-3)13(21)19(16)11-25-5)18(10-24-4)14(22)20(16)12-26-6/h7-12H2,1-6H3 | [InChIKey]
FPLHXUPONQTGOH-UHFFFAOYSA-N | [SMILES]
C1(=O)N(COC)C2(C)N(COC)C(=O)N(COC)C2(CCC)N1COC |
| Hazard Information | Back Directory | [Uses]
Imidazo[4,5-d]imidazole-2,5(1H,3H)-dione,-tetrahydro-1,3,4,6-tetrakis(methoxymethyl)-3a-methyl-6a-propyl can be used as a resist undercoat film composition in semiconductor lithography processes. |
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