SILICON CARBIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18..

SILICON CARBIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.5% (METALS BASIS)|碳化硅溅射靶基本信息更多信息

中文名称:	碳化硅溅射靶
中文同义词:	碳化硅溅射靶
英文名称:	SILICON CARBIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.5% (METALS BASIS)
英文同义词:	SILICON CARBIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK, 99.5% (METALS BASIS)
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