SILICON(IV) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6...
| | SILICON(IV) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)| 基本信息 更多信息 |
| 中文名称: | | | 中文同义词: | | | 英文名称: | SILICON(IV) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS) | | 英文同义词: | SILICON(IV) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS) | | CAS号: | | | 分子式: | O2Si | | 分子量: | 60.0843 | | EINECS号: | |  |
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SILICON(IV) OXIDE SPUTTERING TARGET, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS) 推荐供应商 |
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