- VANADIUM SILICIDE
-
- $0.00 / 1KG
-
2019-09-02
- CAS:12039-87-1
- Min. Order: 1KG
- Purity: 85.0-99.8%
- Supply Ability: 200kg
|
| | VANADIUM SILICIDE Basic information | | Uses |
| Product Name: | VANADIUM SILICIDE | | Synonyms: | VANADIUM DISILICIDE;VANADIUM SILICIDE;Vanadiumsilicidemesh;bis(λ2-silanylidene)vanadium;VANADIUM SILICIDE -325 MESH;VANADIUM SILICIDE, 99.5% (METALS BASIS);VANADIUM SILICIDE: 99.5%, -325 MESH;bis(λ2-silanylidene)vanadium | | CAS: | 12039-87-1 | | MF: | Si2V | | MW: | 107.11 | | EINECS: | 234-908-5 | | Product Categories: | | | Mol File: | 12039-87-1.mol |  |
| | VANADIUM SILICIDE Chemical Properties |
| Melting point | 1677 °C | | density | 4.420 | | solubility | soluble in HF | | form | metallic prisms | | color | metallic prisms | | Resistivity | 9.5 (ρ/μΩ.cm) | | Water Solubility | soluble HF [KIR83] | | Crystal Structure | Hexagonal | | EPA Substance Registry System | Vanadium silicide (VSi2) (12039-87-1) |
| Hazard Codes | Xi | | Risk Statements | 36/37 | | Safety Statements | 26-36 | | WGK Germany | 3 | | TSCA | TSCA listed | | HazardClass | 6.1 |
| | VANADIUM SILICIDE Usage And Synthesis |
| Uses | Silicides are key materials for fabricating large-scale integrated circuits. They can be used as ohmic contacts, Schottky barriers, and electrode leads in circuits, and are essential for the shallow junction depth of very large-scale integrated circuits. The main applications of vanadium silicide are as follows: 1. Fabrication of vanadium silicide thin films. 2. Fabrication of a sound-absorbing ceramic material. | | Chemical Properties | metallic prisms; -325 mesh; as a 99.5% pure material, used as a sputtering target in the fabrication of integrated circuits and as an electrochemical cathode [ALD94] [KIR83] [ALF93] [CER91] |
| | VANADIUM SILICIDE Preparation Products And Raw materials |
|