TRI-T-BUTOXYSILANOL

TRI-T-BUTOXYSILANOL Suppliers list

Company Name:	Shanghai Daken Advanced Materials Co.,Ltd
Tel:	+86-2158073036
Email:	info@dakenam.com
Products Intro:	Product Name:TRI-t-BUTOXYSILANOL CAS:18166-43-3 Purity:99% Package:1KG,5KG,10KG

Company Name:	ATK CHEMICAL COMPANY LIMITED
Tel:	+undefined-21-51877795
Email:	ivan@atkchemical.com
Products Intro:	Product Name:tri-t-butoxysilanol CAS:18166-43-3 Purity:98% HPLC Package:5G;10G;25G;50G;100G;250G;1KG

Company Name:	career henan chemical co
Tel:	+86-0371-86658258 +8613203830695
Email:	sales@coreychem.com
Products Intro:	Product Name:TRI-T-BUTOXYSILANOL CAS:18166-43-3 Purity:99% Package:1KG;2USD

Company Name:	Win-Win Chemical CO., Limited
Tel:	0086-577-64498589
Email:	sales@win-winchemical.com
Products Intro:	Product Name:tri-t-butoxysilanol CAS:18166-43-3 Purity:98% Package:1kg,5kg,10kg

Company Name:	Antai Fine Chemical Technology Co.,Limited
Tel:	18503026267
Email:	info@antaichem.com
Products Intro:	Product Name:Tris(tert-butoxy)silanol CAS:18166-43-3 Purity:0.98 Package:1KG;5KG;25KG

TRI-T-BUTOXYSILANOL manufacturers

TRI-T-BUTOXYSILANOL Basic information

Product Name:	TRI-T-BUTOXYSILANOL
Synonyms:	TRI-T-BUTOXYSILANOL;TRIS(TERT-BUTOXY)SILANOL;TRIS(T-BUTOXY)SILANOL;Tri-tert-butoxysilanol;Tri-t-butoxysilanol (99.9+%-Si);Tri-t-butoxysilanol (99.999%-Si) PURATREM 14-7015 contained in 50 ml Swagelok(R) cylinder (96-1077) for CVD/ALD;hydroxy-tris[(2-methylpropan-2-yl)oxy]silane;Tri-t-butoxysilanol PURATREM 14-7015 contained in 50 Ml Swagelokcylinder (96-1077) for CVD/ALD
CAS:	18166-43-3
MF:	C12H28O4Si
MW:	264.43
EINECS:
Product Categories:	Micro/Nanoelectronics;Organosilicon;Precursors by Metal;Precursors Packaged for Deposition SystemsOrganometallic Reagents;SilanolsVapor Deposition Precursors;Vapor Deposition Precursors;14: Silicon;Chemical Synthesis;CVD and ALD Precursors by Metal;CVD and ALD Precursors Packaged for Deposition Systems;Materials Science;Organometallic Reagents;Silanols;Silicon;Vapor Deposition Precursors;Silanes;Solution Deposition Precursors
Mol File:	18166-43-3.mol

TRI-T-BUTOXYSILANOL Chemical Properties

Melting point	63-65 °C(lit.)
Boiling point	205-210 °C(lit.)
density	0,92 g/cm³
Fp	>65°C
storage temp.	Inert atmosphere,Room Temperature
form	solid
pka	11.78±0.53(Predicted)
Sensitive	moisture sensitive
Hydrolytic Sensitivity	7: reacts slowly with moisture/water
InChI	1S/C12H28O4Si/c1-10(2,3)14-17(13,15-11(4,5)6)16-12(7,8)9/h13H,1-9H3
InChIKey	HLDBBQREZCVBMA-UHFFFAOYSA-N
SMILES	CC(C)(C)O[Si](O)(OC(C)(C)C)OC(C)(C)C

Safety Information

MSDS Information

Provider	Language
SigmaAldrich	English

TRI-T-BUTOXYSILANOL Usage And Synthesis

Uses	Silicon oxide source for rapid atomic layer deposition to prepare various nanolaminates.
Uses	Precursors Packaged for Depositions Systems
Uses	Tris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH₃)₂)₄) for vapor phase deposition of hafnium silicate glass films. Tris(tert-butoxy)silanol is used for atomic layer deposition (ALD) of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates.
General Description	Tris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica.

TRI-T-BUTOXYSILANOL Preparation Products And Raw materials

Raw materials	Di-tert-butoxydichlorosilane.-->TRI-T-BUTOXYCHLOROSILANE-->Water-->Sodium tert-butoxide-->tert-Butanol-->Isobutylene
Preparation Products	Tetrahydrofuran

Tag:TRI-T-BUTOXYSILANOL(18166-43-3) Related Product Information

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