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HAFNIUM TERT-BUTOXIDE

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Products Intro: Product Name:HAFNIUM TERT-BUTOXIDE
CAS:2172-02-3
Purity:99% Package:200KG;0.00;USD
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Products Intro: Product Name:Hafnium(IV) tert-butoxide
CAS:2172-02-3
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CAS:2172-02-3
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Products Intro: Product Name:Hafnium t-butoxide
CAS:2172-02-3
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Products Intro: Product Name:HAFNIUM TERT-BUTOXIDE
CAS:2172-02-3
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HAFNIUM TERT-BUTOXIDE manufacturers

  • HAFNIUM TERT-BUTOXIDE
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  • $0.00 / 200KG
  • 2025-06-27
  • CAS:2172-02-3
  • Min. Order: 1KG
  • Purity: 99%
  • Supply Ability: 500000kg
HAFNIUM TERT-BUTOXIDE Basic information
Product Name:HAFNIUM TERT-BUTOXIDE
Synonyms:HAFNIUM (IV) T-BUTOXIDE;HAFNIUM T-BUTOXIDE;HAFNIUM TERT-BUTOXIDE;HAFNIUM TETRA-T-BUTOXIDE;Hafnium(IV) t-butoxide (99.9%-Hf);Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.2%;Hafnium(IV) tert-butoxide;Hafnium(IV) tert-butoxide, 99.9% trace metals basis excluding Zr
CAS:2172-02-3
MF:C16H36HfO4
MW:470.94
EINECS:
Product Categories:metal alkoxide;Hafnium;Micro/Nanoelectronics;Solution Deposition Precursors
Mol File:2172-02-3.mol
HAFNIUM TERT-BUTOXIDE Structure
HAFNIUM TERT-BUTOXIDE Chemical Properties
Melting point 2℃
Boiling point 90 °C5 mm Hg(lit.)
density 1.166 g/mL at 25 °C(lit.)
refractive index n20/D 1.424(lit.)
Fp 83 °F
solubility Soluble in hydrocarbons, reacts with alcohols, ketones, and esters
form Liquid
Specific Gravity1.166
Sensitive Moisture Sensitive/Light Sensitive
Hydrolytic Sensitivity7: reacts slowly with moisture/water
Exposure limitsACGIH: TWA 0.5 mg/m3
NIOSH: IDLH 50 mg/m3; TWA 0.5 mg/m3
InChI1S/4C4H9O.Hf/c4*1-4(2,3)5;/h4*1-3H3;/q4*-1;+4
InChIKeyWZVIPWQGBBCHJP-UHFFFAOYSA-N
SMILESCC(C)(C)O[Hf](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C
CAS DataBase Reference2172-02-3(CAS DataBase Reference)
Safety Information
Hazard Codes Xi
Risk Statements 10-36/37/38
Safety Statements 16-26
RIDADR UN 1993 3/PG 3
WGK Germany 3
TSCA No
HazardClass 3
PackingGroup II
HS Code 2905190019
Storage Class3 - Flammable liquids
Hazard ClassificationsEye Irrit. 2
Flam. Liq. 3
Skin Irrit. 2
STOT SE 3
MSDS Information
ProviderLanguage
SigmaAldrich English
ALFA English
HAFNIUM TERT-BUTOXIDE Usage And Synthesis
UsesHafnium tert-butoxide [Hf(OtBu)4] is a mononuclear; volatile; and highly promising precursor for the deposition of HfO2 and other hafnium doped thin films by vapor deposition techniques. The deposited films show high dielectric constant suitable for semiconductor devices.
General DescriptionAtomic number of base material: 72 Hafnium
reaction suitabilitycore: hafnium
HAFNIUM TERT-BUTOXIDE Preparation Products And Raw materials
Tag:HAFNIUM TERT-BUTOXIDE(2172-02-3) Related Product Information
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