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| | Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane Basic information |
| | Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane Chemical Properties |
| Hazard Codes | T | | Risk Statements | 45-46-45/46 | | Safety Statements | 53-23-36/37/39-45 | | WGK Germany | 3 | | RTECS | VV4000000 | | F | 3-10 | | TSCA | Yes | | HS Code | 29319090 | | Toxicity | LD50 oral in rat: 8mL/kg |
| | Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane Usage And Synthesis |
| Uses | Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane may be used as a precursor to form SiCOH film via sol-gel. The silane may be used to functionalize alumina nanoparticles towards the fabrication of polyamide 12/alumina nanocomposites. 4 Basalt fibers were functionalized with this silane and its consequent effect on the fabrication of basalt fiber–epoxidized vegetable oil matrix composite materials was analyzed.Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane can be used as a silane based coupling agent to functionalize a variety of substrates. It modifies the surface to improve the dispersion of nanoparticles. It can be used as an adhesion promoter by treating the precursor material with epoxy silanes. | | Uses | Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane was used as an adhesion promoter during the fabrication of:
- a photoacid generator activated by two photon excitation.
- nanoscale polymeric structures (width: 65 nm) using 520 nm femtosecond pulse excitation.
Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane may be used as a precursor to form SiCOH film via sol-gel. The silane may be used to functionalize alumina nanoparticles towards the fabrication of polyamide 12/alumina nanocomposites. 4 Basalt fibers were functionalized with this silane and its consequent effect on the fabrication of basalt fiber–epoxidized vegetable oil matrix composite materials was analyzed. | | Application | Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane was used as an adhesion promoter during the fabrication of:a photoacid generator activated by two photon excitation.nanoscale polymeric structures (width: 65 nm) using 520 nm femtosecond pulse excitation. | | Flammability and Explosibility | Non flammable | | Synthesis | 
The apparatus of Example B was charged with 148.8 g (1.2 mol) of 1-vinyl-3,4-epoxycyclohexane, 1.3 g of a carboxylic acid promoter, and 0.15 ml of 10% chloroplatinic acid catalyst solution. The flask contents were heated to 89?? C. and dropwise addition of 122.8 g {[1.0 mol) of trimethoxysilane was begun. The reaction temperature was controlled at 90??-95?? C. with an ice bath. Reaction was maintained at that temperature for half an hour after completion of addition, which took 18 minutes. Analysis by gas chromatography showed a yield of 90% of 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane. This example demonstrates a standard preparation of 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane using commercial chloroplatinic acid. |
| | Trimethoxy[2-(7-oxabicyclo[4.1.0]hept-3-yl)ethyl]silane Preparation Products And Raw materials |
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