헥사메틸다이사이록산

헥사메틸다이사이록산
헥사메틸다이사이록산 구조식 이미지
카스 번호:
107-46-0
한글명:
헥사메틸다이사이록산
동의어(한글):
비스(트라이메틸실일)산화물;비스(트리메틸실일)산화물;헥사메틸디실록산;헥사메틸다이사이록산;비스(트라이메틸실일)산화물;다이실록세인
상품명:
Hexamethyldisiloxane
동의어(영문):
HMDSO;HMDO;DISILOXANE;1,1,1,3,3,3-Hexamethyldisiloxane;SILICONE FLUID;Fluka AG;Hexamethylene disiloxane;hexamethyldisiloxane(hmdo);os10;H7310
CBNumber:
CB2446352
분자식:
C6H18OSi2
포뮬러 무게:
162.38
MOL 파일:
107-46-0.mol
MSDS 파일:
SDS

헥사메틸다이사이록산 속성

녹는점
−59 °C(lit.)
끓는 점
101 °C(lit.)
밀도
0.764 g/mL at 20 °C(lit.)
증기 밀도
>1 (vs air)
증기압
20 hPa (20 °C)
굴절률
n20/D 1.377(lit.)
인화점
33 °F
저장 조건
Store below +30°C.
용해도
0.00037g/l 불용성
물리적 상태
액체
Specific Gravity
0.76
색상
무색 내지 거의 무색
폭발한계
0.5-21.8%(V)
수용성
불용성
Hydrolytic Sensitivity
1: no significant reaction with aqueous systems
BRN
1736258
Dielectric constant
2.2(20℃)
안정성
안정적이지만 습기에 민감합니다. 가연성이 높습니다. 강산, 강염기, 산화제와 호환되지 않습니다.
InChIKey
UQEAIHBTYFGYIE-UHFFFAOYSA-N
LogP
5.06 at 20℃
CAS 데이터베이스
107-46-0(CAS DataBase Reference)
NIST
Disiloxane, hexamethyl-(107-46-0)
EPA
Hexamethyldisiloxane (107-46-0)
안전
  • 위험 및 안전 성명
  • 위험 및 사전주의 사항 (GHS)
위험품 표기 F,N,T
위험 카페고리 넘버 11-50/53-65-51/53-48/23/24/25-36/38-46-45
안전지침서 16-61-62-45-26-53
유엔번호(UN No.) UN 1993 3/PG 2
WGK 독일 3
RTECS 번호 JM9237000
F 고인화성물질 10
자연 발화 온도 340 °C
TSCA Yes
위험 등급 3
포장분류 II
HS 번호 29310095
유해 물질 데이터 107-46-0(Hazardous Substances Data)
독성 LD50 orally in Rabbit: > 12160 mg/kg LD50 dermal Rat > 2000 mg/kg
기존화학 물질 KE-18607
사고대비 물질 필터링 80
그림문자(GHS): GHS hazard pictogramsGHS hazard pictograms
신호 어: Danger
유해·위험 문구:
암호 유해·위험 문구 위험 등급 범주 신호 어 그림 문자 P- 코드
H225 고인화성 액체 및 증기 인화성 액체 구분 2 위험 GHS hazard pictograms P210,P233, P240, P241, P242, P243,P280, P303+ P361+P353, P370+P378,P403+P235, P501
H410 장기적 영향에 의해 수생생물에 매우 유독함 수생 환경유해성 물질 - 만성 구분 1 경고 GHS hazard pictograms P273, P391, P501
예방조치문구:
P210 열·스파크·화염·고열로부터 멀리하시오 - 금연 하시오.
P273 환경으로 배출하지 마시오.
NFPA 704
4
2 1

헥사메틸다이사이록산 MSDS


Hexamethyldisiloxane

헥사메틸다이사이록산 C화학적 특성, 용도, 생산

화학적 성질

Hexamethyldisiloxane (HMDS) is a colorless or yellowish transparent liquid with a measured melting point of -68.2°C and a measured boiling point of 100.5°C at 1013 hPa. The measured vapor pressure is 44.51 hPa at 20 oC. The measured water solubility is 0.93 ± 0.63 mg/L at 23 oC. The measured log Kow of HMDS is 5.20 at 20 oC. Estimated log Koc values using EPISuite v 4.10 range from 2.5 (MCI method) to 4.5 (Kow method). As Episuite does not contain fragments for siloxanes for log Koc predictions, these values should be treated with caution. The potential for hydrolysis of the test substance may have influenced the determination of partition coefficient and water solubility.

물리적 성질

Hexamethyldisiloxane is a colorless and transparent liquid. It is easily deliquescent, flammable, and has the risk of causing combustion when exposed to high heat, open flame, and strong oxidizing agents. Boiling point 99.5℃. Flash point -1.1℃. Relative density (d2525) 0.7606. refractive index 1.3750. insoluble in water, soluble in many organic solvents.

용도

Hexamethyldisiloxane is used as a base fluid in a wide range of personal care products that require fast evaporation and high spreadability. When blended with Dimethicone fluids, It can adjust the residence time of the silicone on the skin. Unlike other volatile fluids, Hexamethyldisiloxane Fluid does not cool the skin as it evaporates. Hexamethyldisiloxane is used as a carrying agent and diluent in the following: skin cream lotions, bath oils, suntan lotions, nail polishes, antiperspirants, deodorants, hair sprays and other beauty and hair care products.
A silicon based compound that can be used to create potentially biocompatible materials.
Used as a monomer in the synthesis of long chain polysiloxane structures.
Used in the methylation of mercury(II) salts.

정의

ChEBI: Hexamethyldisiloxane is an organosiloxane consisting of two trimethylsilyl groups covalently bound to a central oxygen.

생산 방법

Produced via acid hydrolysis of chlorotrimethylsilane and purification by distillation.

일반 설명

Hexamethyldisiloxane (HMDSO), a linear polydisiloxane, is an organosilicon reagent commonly utilized as a source for plasma enhanced chemical vapor deposition (PE-CVD) of thin films of silicon compounds. It is also employed as a substitute to silane in silicon integrated circuit technology. Its dissociative ionization by electron impact has been studied by Fourier transform mass spectrometry. Synthesis of plasma-polymerized HMDSO thin films by atmospheric pressure glow (APG) discharge has been reported. Crystals of HMDSO at 148K are monoclinic. Addition of HMDSO to P4S10, improves its efficiency as thionating agent.

Purification Methods

Fractionally distil through a column packed with glass helices with ca 15 theoretical 20 1.3777. plates. It is highly flammable and is an irritant. [Mills & McKenzie J Am Chem Soc 76 2672 1954, Csakvari et al. J Organometal Chem 107 287 1976, Beilstein 4 IV 4018.]

헥사메틸다이사이록산 준비 용품 및 원자재

원자재

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