硅化钛
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- CAS号:
- 12039-83-7
- 英文名:
- TITANIUM SILICIDE
- 英文别名:
- TITANIUM SILICIDE;Titanium disilicon;Titanium disilicde;TITANIUM DISILICIDE;titanium(IV) silicide;titaniumsilicide(tisi2);Titanium silicSIT8042.0;Titanium silicide, 99.5%;Titaniumsilicide(99+%-Ti);TITANIUM SILICIDE, POWDER
- 中文名:
- 硅化钛
- 中文别名:
- 硅化钛;二硅化钛;硅化钛粉;二硅化钛粉;硅化钛溅射靶;多层 TI3C2TX;硅化钛(TISI2);二硅化钛 TISI2;二矽化钛超微粉末,APS 20-30NM;硅化钛溅射靶, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK,
- CBNumber:
- CB9283622
- 分子式:
- Si2Ti
- 分子量:
- 104.04
- MOL File:
- 12039-83-7.mol
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硅化钛化学性质
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熔点:
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1540°C
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沸点:
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1540°C
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密度:
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4,39 g/cm3
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RTECS号:
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XR2420000
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溶解度:
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insoluble in H2O, acid solutions, alkaline solutions; soluble in HF
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形态:
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Powder
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颜色:
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Gray
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电阻率 (resistivity):
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123 (ρ/μΩ.cm)
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水溶解性:
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Soluble in hydrofluoric acid. Insoluble in water.
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晶体结构:
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Orthorhombic
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EPA化学物质信息:
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Titanium silicide (TiSi2) (12039-83-7)
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硅化钛性质、用途与生产工艺
生产方法
1.将金属钛和金属硅放入电弧炉内，在氩气气氛下于1100℃熔融制得二硅化钛。
2.
采用合成法。将金属钛和金属硅放入电弧炉内，在氩气气氛下于1100℃熔融，即制得二硅化钛。
硅化钛
上下游产品信息
上游原料
下游产品
| 更新日期 | 产品编号 | 产品名称 | CAS编号 | 包装 | 价格 |
|---|
| 2025/09/19 | 013088 | 硅化钛, 99.5% (metals basis)
Titanium silicide, 99.5% (metals basis) | 12039-83-7 | 250g | 3238元 |
| 2025/09/19 | 013087 | 硅化钛, 99.5% (metals basis)
Titanium silicide, 99.5% (metals basis) | | 250g | 7145元 |
硅化钛
生产厂家
全球有 87家供应商
硅化钛国内生产厂家
12039-83-7, 硅化钛 相关搜索:
- metal silicide
- 金属催化剂
- 硅化物-二硅化钛
- 硅化物粉体-硅化钛（TiSi2)
- 硅化物
- 硅化物-硅化钛
- 硅化物粉体-硅化钛
- 硅烷试剂
- TiSi2
- H2Si2Ti
- 硅化钛粉
- 二硅化钛 TISI2
- 硅化钛(TISI2)
- 多层 TI3C2TX
- 二硅化钛
- 硅化钛溅射靶, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK,
- 硅化钛溅射靶, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK,
- 硅化钛溅射靶, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK,
- 硅化钛溅射靶, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK,
- 硅化钛溅射靶
- 硅化钛溅射靶,50.8MM(2.0IN)DIAX3.18MM(0.125IN)THICK,99.5%(METALSBASIS)
- 硅化钛溅射靶,76.2MM(3.0IN)DIAX6.35MM(0.250IN)THICK,99.5%(METALSBASIS)
- 硅化钛溅射靶,76.2MM(3.0IN)DIAX3.18MM(0.125IN)THICK,99.5%(METALSBASIS)
- 二矽化钛超微粉末,APS 20-30NM
- 硅化钛溅射靶,50.8MM(2.0IN)DIAX6.35MM(0.250IN)THICK,99.5%(METALSBASIS)
- 硅化钛溅射靶, 76.2MM (3.0IN) 直径 X 6.35MM (0.250IN) 厚, 99.5% (METALS BASIS)
- 硅化钛溅射靶, 76.2MM (3.0IN) 直径 X 3.18MM (0.125IN) 厚, 99.5% (METALS BASIS)
- 硅化钛溅射靶, 50.8MM (2.0IN) 直径 X 6.35MM (0.250IN) 厚, 99.5% (METALS BASIS)
- 硅化钛溅射靶, 50.8MM (2.0IN) 直径 X 3.18MM (0.125IN) 厚, 99.5% (METALS BASIS)
- 二硅化钛粉
- 硅化钛
- 12039-83-7
- Calcium (Ca) Sputtering Targets
- titanium(IV) silicide
- Titanium silicide, 99.5%
- TITANIUM SILICIDE ISO 9001：2015 REACH
- Ti3C2Tx (MXene) several layer
- TITANIUM SILICIDE -325 MESH
- Titaniumsilicidemicronpowderblackpowder
- Titanium silicSIT8042.0
- TITANIUM SILICIDE
- TITANIUM DISILICIDE
- Titanium disilicide powder (TiSi2)
- Titanium silicide, 99.5% trace metals basis
- TITANIUM SILICIDE, 95%, powder
- titaniumsilicide(tisi2)
- Titanium silicide sputtering target, 76.2mm (3.0 in.) dia. x 3.18mm (0.125 in.) thick
- Titanium silicide sputtering target, 50.8mm (2.0 in.) dia. x 6.35mm (0.250 in.) thick
- bis(λ2-silanylidene)titanium
- Titanium disilicide nanopowder, APS 20-30nm
- Titanium silicide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basi
- Titanium silicide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basi
- Titanium silicide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basi
- Titanium silicide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basi
- Titanium silicide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
- Titanium silicide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)
- Titanium silicide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
- Titanium silicide, 99.5% (metals basis)