- tris(dimethylamino)silane
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- $3.00 / 25KG
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2025-10-13
- CAS:15112-89-7
- Min. Order: 0.1KG
- Purity: 99%
- Supply Ability: g-kg-tons, free sample is available
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| | TRIS(DIMETHYLAMINO)SILANE Basic information |
| Product Name: | TRIS(DIMETHYLAMINO)SILANE | | Synonyms: | TRIS(DIMETHYLAMINO)SILANE;n,n,n’,n’,n’’,n’’-hexamethyl-silanetriamin;n,n,n’,n’,n’’,n’’-hexamethylsilanetriamine;N,N,N’,N’,N’’,N’’-hexamethyl-Silanetriamine;TRIS(DIMETHYLAMINO)SILANE 99+%;N,N',N''-(Silanetriyl)tris(dimethylamine);N,N',N''-Silanetriyltris(dimethylamine);TRIS(DIMETHYLAMINO)SILANE, 99.9+% | | CAS: | 15112-89-7 | | MF: | C6H19N3Si | | MW: | 161.32 | | EINECS: | 239-165-0 | | Product Categories: | ALD Precursors;organosilicon compounds | | Mol File: | 15112-89-7.mol |  |
| | TRIS(DIMETHYLAMINO)SILANE Chemical Properties |
| Melting point | <0°C | | Boiling point | 145 °C | | density | 0,838 g/cm3 | | refractive index | 1.4247 | | Fp | 25°C | | storage temp. | 2-8°C, protect from light | | form | liquid | | pka | 10.93±0.70(Predicted) | | Specific Gravity | 0.84 | | color | colorless to light yellow | | Hydrolytic Sensitivity | 8: reacts rapidly with moisture, water, protic solvents | | Sensitive | air sensitive, moisture sensitive | | InChI | 1S/C6H19N3Si/c1-7(2)10(8(3)4)9(5)6/h10H,1-6H3 | | InChIKey | TWVSWDVJBJKDAA-UHFFFAOYSA-N | | SMILES | CN(C)[SiH](N(C)C)N(C)C | | EPA Substance Registry System | N,N,N',N',N'',N''-Hexamethylsilanetriamine (15112-89-7) |
| Hazard Codes | F,C | | Risk Statements | 10-36/37/38-52/53-34-29-20-15-11 | | Safety Statements | 16-26-36/37/39-45-43 | | RIDADR | 1993 | | WGK Germany | 3 | | RTECS | VV5800000 | | TSCA | TSCA listed | | Storage Class | 4.3 - Hazardous materials which set free flammable gases upon contact with water | | Hazard Classifications | Acute Tox. 3 Dermal
Acute Tox. 3 Inhalation
Acute Tox. 4 Oral
Eye Dam. 1
Flam. Liq. 2
Skin Corr. 1B
Water-react 2 | | Toxicity | rabbit,LD50,skin,477mg/kg (477mg/kg),LIVER: OTHER CHANGESLUNGS, THORAX, OR RESPIRATION: CHRONIC PULMONARY EDEMA,Toxicology and Industrial Health. Vol. 5, Pg. 45, 1989. |
| | TRIS(DIMETHYLAMINO)SILANE Usage And Synthesis |
| Uses | Tris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride; carbonitride; nitride and oxide thin films. It is also used to form multicomponent silicon containing thin films. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range; thus making it a very good vapor deposition precursor. | | General Description | Please inquire for quantity, pricing, and packaging options. | | reaction suitability | reagent type: reductant | | Synthesis | A method for preparing tris(dimethylamino)silane, comprising the steps of: adding dimethylamine and a hydrocarbon solvent to a reactor under the protection of an inert atmosphere, and then adding an organolithium compound to the system to produce a lithium salt of dimethylamine; adding trichlorosilane to the system; and distilling at the end of the reaction to obtain tris(dimethylamino)silane. |
| | TRIS(DIMETHYLAMINO)SILANE Preparation Products And Raw materials |
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