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| | TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Basic information | | Uses |
| | TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Chemical Properties |
| Melting point | 104-105.5 °C(lit.) | | Boiling point | 55.7 °C760 mm Hg | | Fp | 56 °C | | form | crystal | | color | white | | Water Solubility | Miscible with Water. | | Sensitive | Moisture Sensitive | | InChI | 1S/6C2H6N.2Ga/c6*1-3-2;;/h6*1-2H3;;/q4*-1;4*+1 | | InChIKey | RVOVCNXACQVIAT-UHFFFAOYSA-N | | SMILES | CN(C)[Ga-]1(N(C)C)[N+](C)(C)[Ga-](N(C)C)(N(C)C)[N+]1(C)C |
| Hazard Codes | F,C | | Risk Statements | 11-14-34 | | Safety Statements | 16-26-36/37/39-45 | | RIDADR | UN 2925 4.1/PG 2 | | WGK Germany | 3 | | HazardClass | 4.3 | | Storage Class | 4.3 - Hazardous materials which set free flammable gases upon contact with water | | Hazard Classifications | Eye Dam. 1 Flam. Sol. 1 Skin Corr. 1B Water-react 1 |
| | TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Usage And Synthesis |
| Uses | Tris(dimethylamido)gallium(III) can be used in the following fields:
- Reagent used for the growth of gallium oxide films via the reaction with alcohols or water.
- Complex used for the ALD of gallium oxide films.
- Complex used in a new pyrolysis route to GaN quantum dots.
- Complex used for the generation of monodispersed, colloidal gallium nanoparticles.
- Complex used for the atomic layer deposition of gallium sulfide films.
| | Uses | Gallium nitride film precursor. Used as Reagent. | | General Description | Atomic number of base material: 31 Gallium | | reaction suitability | core: gallium reagent type: catalyst |
| | TRIS(DIMETHYLAMIDO)GALLIUM(III) 98 Preparation Products And Raw materials |
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