- Tetravinylsilane
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- $5.00 / 200KG
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2026-05-04
- CAS:1112-55-6
- Min. Order: 1KG
- Purity: 99%
- Supply Ability: 500mt/year
- Tetravinylsilane
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- $0.10 / 1KG
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2025-12-24
- CAS:1112-55-6
- Min. Order: 1KG
- Purity: 98.0%
- Supply Ability: 10
- TETRAVINYLSILANE
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- $0.00 / 1KG
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2025-07-02
- CAS:1112-55-6
- Min. Order: 1KG
- Purity: 98%
- Supply Ability: 1000KG /month
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| | Tetravinylsilane Basic information |
| | Tetravinylsilane Chemical Properties |
| Melting point | <0°C | | Boiling point | 130-131 °C(lit.) | | density | 0.8 g/mL at 25 °C(lit.) | | vapor pressure | 18.6hPa at 25℃ | | refractive index | n20/D 1.461(lit.) | | Fp | 43 °F | | form | liquid | | Specific Gravity | 0.815 | | Water Solubility | 7.26mg/L at 20℃ | | Hydrolytic Sensitivity | 4: no reaction with water under neutral conditions | | BRN | 1739438 | | InChI | InChI=1S/C8H12Si/c1-5-9(6-2,7-3)8-4/h5-8H,1-4H2 | | InChIKey | UFHILTCGAOPTOV-UHFFFAOYSA-N | | SMILES | [Si](C=C)(C=C)(C=C)C=C | | LogP | 4.3 at 25℃ | | CAS DataBase Reference | 1112-55-6(CAS DataBase Reference) | | EPA Substance Registry System | Silane, tetraethenyl- (1112-55-6) |
| Hazard Codes | F,Xi | | Risk Statements | 11-36/37/38 | | Safety Statements | 16-26-36/37/39 | | RIDADR | UN 1993 3/PG 2 | | WGK Germany | 3 | | F | 10-21 | | TSCA | TSCA listed | | HazardClass | 3.1 | | PackingGroup | II | | Storage Class | 3 - Flammable liquids | | Hazard Classifications | Eye Irrit. 2
Flam. Liq. 2
Skin Irrit. 2
STOT SE 3 |
| | Tetravinylsilane Usage And Synthesis |
| Chemical Properties | clear yellow liquid | | Uses | Tetravinylsilane is a useful research chemical compound. | | Application | Tetravinylsilane (TVS) could be used to deposit hydrogenated amorphous silicon carbide (a-SiC: H) films to study the influence of RF (13.56 MHz) pulsed plasma on the double bond. It can also be used as a monomer for the deposition of pp-TVS films[1-2]. | | Flammability and Explosibility | Flammable | | References | [1] V. Cech. “Physico-chemical properties of plasma-polymerized tetravinylsilane.” Surface & Coatings Technology 201 1 (2007): 5512–5517.
[2] V. Cech. “Influence of Oxygen on the Chemical Structure of Plasma Polymer Films Deposited from a Mixture of Tetravinylsilane and Oxygen Gas.” Plasma Processes and Polymers 52 2 (2007). |
| | Tetravinylsilane Preparation Products And Raw materials |
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